What is a microwave vacuum plasma cleaning machine:

The principle of microwave vacuum plasma cleaning machine is to use microwave energy to excite gas molecules in a vacuum environment, generate plasma, and then use the active particles (such as ions, electrons, free radicals, etc.) in the plasma to undergo physical or chemical reactions with the material surface, thereby achieving cleaning, etching, activation and other treatments on the material surface.

In a vacuum chamber, microwave energy is injected into the chamber through a microwave generator (typically operating at 2.45 GHz) to excite the process gases (such as argon, oxygen, hydrogen, etc.) to ionize and form high-density plasma.

High energy ions and electrons in plasma bombard the surface of materials, causing pollutants, impurities, etc. on the surface to be removed by sputtering. The active free radicals in the plasma react chemically with pollutants on the surface of the material, generating volatile products that facilitate cleaning.

The common fields of microwave vacuum plasma cleaning machines from Zhenyi Corporation are as follows:

1. Semiconductor manufacturing: used for removing photoresist, cleaning wafer surfaces, etching silicon, silicon dioxide, silicon nitride, metal interconnect layers, etc., to enhance surface reliability and soldering quality.

2. Optoelectronics and displays: In liquid crystal displays (LCDs), the ink surface of the touch screen needs to be adhered to other components, and the touch surface needs to be coated. Vacuum ions can clean both surfaces simultaneously to improve their adhesion and avoid problems such as weak adhesion, fragile coating, and easy detachment;

3. Electronics industry: used for cleaning circuit boards, plasma cleaning and activation of camera modules. Camera modules need to be bonded and sealed. Vacuum plasma can comprehensively clean the surface, effectively activate and improve surface adhesion, and make bonding more reliable;

4. Biomedical field: Used for surface treatment of medical devices to enhance surface compatibility.

5. Optical component manufacturing: used for cleaning various optical components.

6. Plasma cleaning and activation in the metal industry: Some metal products require coating on the surface, and the untreated surface has insufficient adhesion, resulting in weak and uneven coating. Plasma treatment can increase the adhesion of the metal surface, improve surface uniformity, and avoid problems such as uneven coating and easy detachment.

In summary, the advantages of microwave vacuum plasma cleaning machine include:

1. High ionization degree: Microwave plasma has a high ionization degree, a large number of active particles, significant cleaning effect, fast speed, and high efficiency.

2. Efficient cleaning: The microwave plasma cleaning machine has a high cleaning rate, does not require the use of chemical agents, generates no wastewater, meets environmental requirements, and is suitable for large-scale production.

3. Low temperature treatment: The entire process can be carried out at a lower temperature to avoid damage to temperature sensitive materials.

4. Can precisely control the cleaning range and depth.